Materials and Device Characterization in Micromachining II,9780819434722

Materials and Device Characterization in Micromachining II

by ; ;
ISBN13: 9780819434722
ISBN10: 0819434728
Format: Paperback
Pub. Date: 1999-08-01
Publisher(s): Society of Photo Optical
List Price: $115.24

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Table of Contents

Conference Committee vii
Introduction ix
PLENARY PAPERS
Electrokinetic microfluidic systems [3874-100]
2(7)
L. J. Bousse
3D silicon photonic lattices: cornerstone of an emerging photonics revolution [3874-200]
9(11)
J. G. Fleming
S.-Y. Lin
SESSION 1 MEASUREMENT TECHNIQUES I
Fabrication of a full metal AFM probe and its applications for Si and InP device analysis [3875-01]
20(12)
T. Hantschel
T. Trenkler
M. Xu
W. Vandervorst
Design and simulation of thermal actuators for STM applications in a standard CMOS process [3875-02]
32(8)
S. Eagle
H. Lakdawala
G. K. Fedder
Characterization of nanostructures micromachined with focused ion beams (FIBs) [3875-04]
40(10)
C. Y. Wong
J. Xhie
K. M. Moulding
SESSION 2 MEASUREMENT TECHNIQUES II
Optical full-field technique for measuring deflection and strain on micromechanical components [3875-06]
50(11)
P. Aswendt
R. Hofling
K. Hiller
Interferometric measurement for improved understanding of boundary effects in micromachined beams [3875-07]
61(12)
B. D. Jensen
F. Bitsie
M. P. de Boer
Characterization of glass on electronics in MEMS [3875-08]
73(7)
S. Patel
D. Delaney
D. Xu
G. Murphy
H. L. Denton
H. G. Hughes
SESSION 3 MATERIALS CHARACTERIZATION I
Impact testing of silicon-micromachined beams [3875-09]
80(7)
C.-H. Lee
V. Kaajakari
A. Lal
Thick polysilicon processing for MEMS transducer fabrication [3875-10]
87(10)
P. L. Bergstrom
D. R. Bosch
G. Averett
Small-area in-situ MEMS test structure to measure fracture strength by electrostatic probing [3875-11]
97(7)
M. P. de Boer
B. D. Jensen
F. Bitsie
Microfabrication of single-crystal silicon multiple torsional oscillators [3875-12]
104(10)
M. D. Chabot
J. T. Markert
SESSION 4 MATERIALS CHARACTERIZATION II
Powder metallurgic giant magnetostrictive material and its applications in microactuators and microsensors [3875-13]
114(10)
H. Eda
T. Mori
L. Zhou
K. Kubota
J. Shimizu
Mathematical model for optimizing a laser-induced photopolymerization process [3875-14]
124(9)
R. Nassar
M. J. Vasile
J. L. Maxwell
Modifications of DLC films for MEMS applications [3875-15]
133(9)
F. C.-N. Hong
Y.-B. Guo
J.-Y. Wang
New dimensions of micromachining with 157-nm laser light [3875-16]
142(8)
M. Kauf
H. Endert
J. Fair
R. Paetzel
M. J. Scaggs
D. Basting
SESSION 5 HIGH-ASPECT-RATIO PROCESSING
Method for planarizing rigid graphite for use as an x-ray mask substrate [3875-18]
150(5)
P. J. Coane
R. Giasolli
O. Vladimirsky
Y. Vladimirsky
Deformation and stress in PMMA during hard x-ray exposure for deep lithography [3875-19]
155(9)
N. A. Moldovan
Micro cycloid-gear system fabricated by multiexposure LIGA technique [3875-20]
164(10)
T. Hirata
S.-J. Chung
H. Hein
T. Akashi
J. Mohr
SESSION 6 DEVICE CHARACTERIZATION
Reliability of silicon nitride as structural material in MEMS [3875-21]
174(10)
R. Kazinczi
J. R. Mollinger
A. Bossche
Relationship between internal stress and deformation of diaphragm at elevated temperatures using SEM [3875-23]
184(8)
A. Yamashita
Y. Sakai
T. Matsuura
K. Tsutsumi
Tunneling tip engine for microsensors applications [3875-24]
192(10)
M. E. Motamedi
S. Park
A. P. Andrews
M. Khoshnevisan
SESSION 7 POSTER SESSION
Fabrication of x-ray phase masks for sub-70-nm imaging [3875-25]
202(8)
L. Yang
Y. Vladimirsky
J. W. Taylor
Some aspects on the mechanical analysis of microshutters [3875-26]
210(11)
R. K. Fettig
J. L. Kuhn
S. H. Moseley
A. S. Kutyrev
J. Orloff
S. Lu
Characterization of micromachined structures: comparison of measurement and theory [3875-27]
221(9)
S. C. Aceto
A. O. Gutierrez
M. Simkulet
T. W. Krawczyk
M. Lienhard
A. Lundgren
B. Houghton
D. Patti
Resistance of dichromated gelatin as photoresist [3875-28]
230(9)
P. Lin
Y. Yan
G. Jin
M. Wu
Novel approach for the 3D modeling of electrical conduction phenomena in highly anisotropic materials [3875-29]
239(8)
R. Buchhold
R. Gollee
A. Nakladal
G. Gerlach
Prototyping for high-aspect-ratio MEMS by high-energy x-ray lithography using boron-carbide-based masks [3875-30]
247(9)
C. Khan Malek
S. Nguyen
Author Index 256

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